Publication Type |
Journal Article |
School or College |
College of Engineering |
Department |
Materials Science & Engineering |
Creator |
Liu, Feng |
Other Author |
Wang, Hangyao; Zhang, Yu |
Title |
Enhanced growth instability of a strained film on wavy substrate |
Date |
2008 |
Description |
We demonstrate that the growth of a strained film is inherently less stable on a wavy substrate than on a flat substrate. For small surface undulation, the lowest strain energy state is for the film surface to adopt the same wavelength as the substrate surface in an antiphase configuration at the early stage of growth. The critical wavelength (λc) of growth instability on a wavy substrate is half of that on a flat substrate (λ0). It increases linearly with increasing film thickness (t) as λc=λ0 /2+πt. Implications for strain directed self-assembly on patterned substrate are discussed. |
Type |
Text |
Publisher |
American Institute of Physics (AIP) |
Journal Title |
Journal of Applied Physics |
Volume |
104 |
Issue |
5 |
First Page |
54301 |
DOI |
10.1063/1.2968223 |
citatation_issn |
218979 |
Subject |
Growth instability; Strained film; Wavy substrate; Strain induced self-assembly |
Subject LCSH |
Strain theory (Chemistry); Thin films |
Language |
eng |
Bibliographic Citation |
Wang, H., Zhang, Y., & Liu, F. (2008). Enhanced growth instability of a strained film on wavy substrate. Journal of Applied Physics, 104(5), 054301. |
Rights Management |
(c)American Institute of Physics. The following article appeared in Wang, H., Zhang, Y., & Liu, F., Journal of Applied Physics, 104(5), 2008 and may be found at http://dx.doi.org/10.1063/1.2968223 |
Format Medium |
application/pdf |
Format Extent |
238,876 bytes |
Identifier |
ir-main,12116 |
ARK |
ark:/87278/s6ks796s |
Setname |
ir_uspace |
ID |
707435 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6ks796s |