Reactions of Ar+, Ne+, and He+ with SiF4 from thermal energy to 50 eV c.m.

Update Item Information
Publication Type Journal Article
School or College College of Science
Department Chemistry
Creator Armentrout, Peter B.
Other Author Weber, M. E.
Title Reactions of Ar+, Ne+, and He+ with SiF4 from thermal energy to 50 eV c.m.
Date 1989
Description Guided ion-beam techniques are used to measure the cross sections for reaction of SiF4 with Ar+, Ne+, and He+ from thermal to 50 eV. Charge transfer followed by loss of F atoms are the sole processes observed. All SiFx + (x = 0-4) products are observed, except for SiF4 + from reaction with Ne+ and He+, and Si+ from reaction with Ar+.
Type Text
Publisher American Institute of Physics (AIP)
Journal Title The Journal of Chemical Physics
Volume 90
Issue 4
First Page 2213
Last Page 2224
DOI 10.1063/1.456016
citatation_issn 219606
Subject Ion-molecule reactions; Tetrafluorosilane; Rare gas ions; Endothermic reactions; Plasma systems
Subject LCSH Thermochemistry; Excited state chemistry; Surface chemistry; Potential energy surfaces
Language eng
Bibliographic Citation Weber, M. E. & Armentrout, P. B. (1989). Reactions of Ar+, Ne+, and He+ with SiF4 from thermal energy to 50 eV c.m. Journal of Chemical Physics, 90(4), 2213-24.
Rights Management (c)American Institute of Physics. The following article appeared in Weber, M. E. & Armentrout, P. B., Journal of Chemical Physics, 90(4), 1989 and may be found at http://dx.doi.org/10.1063/1.456016.
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Format Extent 166,798 bytes
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Reference URL https://collections.lib.utah.edu/ark:/87278/s61j9txs