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CreatorTitleDescriptionSubjectDate
1 Williams, Clayton C.Scanning capacitance microscope methodology for quantitative analysis of P-N junctionsQuantification of dopant profiles in two dimensions (2D) for p-n junctions has proven to be a challenging problem. The scanning capacitance microscope (SCM) capability for p-n junction imaging has only been qualitatively demonstrated. No well-established physical model exists yet for the SCM data in...p-n junctions; Scanning capacitance microscope; SCM1999
2 Williams, Clayton C.Advances in experimental technique for quantitative two dimensional dopant profiling by scanning capacitance microscopySeveral advances have been made toward the achievement of quantitative two-dimensional dopant and carrier profiling. To improve the dielectric and charge properties of the oxide-silicon interface, a method of low temperature heat treatment has been developed which produces an insulating layer with c...Doping; Scanning capacitance microscope; SCM1999
3 Williams, Clayton C.Two step dopant diffusion study performed in two dimensions by scanning capacitance microscopy and TSUPREM IVWe report the results of a two-step two- dimensional (2D) diffusion study by scanning capacitance microscopy (SCM) and 2D SUPREM IV process simulation. A quantitative 2D dopant profile of a gate-like structure is measured with the SCM on a cross-sectioned polished silicon wafer. The gate-like struct...Scanning capacitance microscopy; SCM; Doping1998
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