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| Creator | Title | Description | Subject | Date | ||
|---|---|---|---|---|---|---|
| 1 |  | Scarpulla, Michael | New methodologies for measuring film thickness, coverage, and topography | We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thi... | Atomic force microscopy; Electron spectroscopy for chemical analysis; X-ray reflectivity | 2000-01 |
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