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1 Stringfellow, Gerald B.Influence of tellurium doping on step bunching of GaAs (001) vicinal surfaces grown by organometallic vapor phase epitaxyAtomic force microscopy has been used to investigate the influence of controlled tellurium Te incorporation on the step structure of GaAs grown by organometallic vapor phase epitaxy on vicinal 001 surfaces. Te doping, using the precursor diethyltelluride, is found to markedly decrease the surface r...Epitaxial growth; Misorientation; Organometallic vapor phase epitaxy1998
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