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1 Liu, FengSurface mobility difference between Si and Ge and its effect on growth of SiGe alloy films and islandsBased on first-principles calculations of surface diffusion barriers, we show that on a compressive Ge(001) surface the diffusivity of Ge is 102-103 times higher than that of Si in the temperature range of 300 to 900 K, while on a tensile surface, the two diffusivities are comparable. Consequently, ...Surface mobility; SiGe film; Strained thin films; Surface diffusion barriers2006-01
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