Effect of oxygen incorporation in semi-insulating (AlxGa1-x)yIn1-yP

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Publication Type Journal Article
School or College College of Engineering
Department Electrical & Computer Engineering; Materials Science & Engineering
Creator Stringfellow, Gerald B.
Other Author McCalmont, J. S.; Casey, H. C. Jr.; Wang, T. Y.
Title Effect of oxygen incorporation in semi-insulating (AlxGa1-x)yIn1-yP
Date 1992
Description Discusses a study conducted on oxygen-doped, semi-insulating layers of (aluminum-gallium) indium phosphide grown on gallium arsenide using organometallic vapor phase epitaxy. Effect of oxygen doping on semi-insulating layers of the substance; Secondary-ion mass spectrometry measurements; Measured concentration of oxygen in the layers of the substance in samples used in the study.
Type Text
Publisher American Institute of Physics (AIP)
Volume 71
Issue 2
First Page 1046
Last Page 1048
Subject Inactive interstitial atoms; Energy-dispersive spectoscopy; intentional oxygen
Subject LCSH Epitaxy; Metal organic chemical vapor deposition; Semiconductor doping
Language eng
Bibliographic Citation Stringfellow, G. B., McCalmont, J. S., Casey, H. C. Jr., & Wang, T. Y. (1992) Effect of oxygen incorporation in semi-insulating (AlxGa1-x)yIn1-yP. Journal of Applied Physics, 71(2), 1046-8.
Rights Management (c)American Institute of Physics. The following article appeared in Stringfellow, G. B., McCalmont, J. S., Casey, H. C. Jr., & Wang, T. Y., Journal of Applied Physics. 71(2), 1992
Format Medium application/pdf
Format Extent 226,636 bytes
Identifier ir-main,1886
ARK ark:/87278/s65q5dr1
Setname ir_uspace
ID 707415
Reference URL https://collections.lib.utah.edu/ark:/87278/s65q5dr1
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