| Publication Type |
journal article |
| School or College |
College of Science |
| Department |
Physics |
| Creator |
Williams, Clayton C. |
| Other Author |
Davis, R. C.; Neuzil, P. |
| Title |
Micromachined submicrometer photodiode for scanning probe microscopy |
| Date |
1995 |
| Description |
A submicrometer photodiode probe with a sub-50 nanometer tip radius has been developed for optical surface characterization on a nanometer scale. The nanoprobe is built to detect subwavelength optical intensity variations in the near field of an illuminated surface. The probe consists of an Al-Si Schottky diode constructed near the end of a micromachined pyramidal silicon tip. The process for batch fabrication of the nanoprobes is described. Electrical and optical characterization measurements of the nanoprobe are presented. The diode has a submicrometer optically sensitive area with a 150 fW sensitivity. |
| Type |
Text |
| Publisher |
American Institute of Physics (AIP) |
| Journal Title |
Applied Physics Letters |
| Volume |
66 |
| Issue |
18 |
| First Page |
2309 |
| Last Page |
2311 |
| DOI |
10.1063/1.114223 |
| citatation_issn |
36951 |
| Subject |
Submicrometer photodiode; Scanning probe microscopy; Nanobrobes |
| Subject LCSH |
Diodes, Semiconductor |
| Language |
eng |
| Bibliographic Citation |
Davis, R. C., Williams, C. C., & Neuzil, P. (1995). Micromachined submicrometer photodiode for scanning probe microscopy. Applied Physics Letters, 66(18), May, 2309-11. |
| Rights Management |
©American Institute of Physics. The following article appeared in Davis, R. C., Williams, C. C., & Neuzil, P., Applied Physics Letters, 66 |
| Format Medium |
application/pdf |
| Format Extent |
121,572 bytes |
| Identifier |
ir-main,8575 |
| ARK |
ark:/87278/s6tt58k2 |
| Setname |
ir_uspace |
| ID |
707349 |
| Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6tt58k2 |
