Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy

Update Item Information
Publication Type Journal Article
School or College College of Engineering
Department Electrical & Computer Engineering; Materials Science & Engineering
Creator Stringfellow, Gerald B.
Other Author Lee, R.T.; Shurtleff, J.K.; Fetzer, C.M.; Lee, S.; Seong, T.Y.
Title Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy
Date 2000
Description The effect of the surfactant Sb has been studied for GaInP semiconductor alloys grown by organometallic vapor phase epitaxy. Dramatic changes in the optical and electrical properties of GaInP with CuPt ordering have been observed. A small concentration of triethylantimony TESb in the vapor is found to cause Sb to accumulate at the surface. In situ surface photoabsorption analysis indicates that Sb changes the surface bonding by replacing the 1 10 P dimers that are responsible for the formation of the CuPt structure during growth with 1 10 Sb dimers. As a result, the degree of order for the GaInP layers is decreased, as shown by transmission electron diffraction studies. The 20 K photoluminescence spectra show a 131 meV peak energy increase for GaInP layers grown on vicinal substrates when a small amount of Sb Sb/P(v) 4 10 4 is added to the system during growth. The use of surfactants to control specific properties of materials is expected to be a powerful tool for producing complex structures. In this article, the growth of heterostructures by modulating the Sb concentration in the vapor is demonstrated.
Type Text
Publisher American Institute of Physics (AIP)
Volume 87
Issue 8
Subject Semiconductors; Surface active agents
Subject LCSH Epitaxy; Metal organic chemical vapor deposition
Language eng
Bibliographic Citation Lee, R.T., Shurtleff, J.K., Fetzer, C.M., Stringfellow, G.B., Lee, S., & Seong, T.Y. (2000). "Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy." J. Appl. Phys. 87(8), 3730.
Rights Management (c)American Institute of Physics. The following article appeared in Lee, R.T., Shurtleff, J.K., Fetzer, C.M., Stringfellow, G.B., Lee, S., & Seong, T.Y., Journal of Applied PHysics, 87(8) 2000
Format Medium application/pdf
Format Extent 110,751 bytes
Identifier ir-main,1910
ARK ark:/87278/s6320dj8
Setname ir_uspace
ID 707200
Reference URL https://collections.lib.utah.edu/ark:/87278/s6320dj8
Back to Search Results