Single-electron manipulation to and from a SiO2 surface by electrostatic force microscopy

Update Item Information
Publication Type Journal Article
School or College College of Science
Department Physics
Creator Williams, Clayton C.
Other Author Bussmann, E.; Zheng, N.
Title Single-electron manipulation to and from a SiO2 surface by electrostatic force microscopy
Date 2005
Description Occupation of individual electron states near the surface of a SiO2 film is controlled by reversible single-electron tunneling to or from a metallic electrostatic force microscope probe. By switching the polarity of an applied dc bias between the probe and the sample to adjust the Fermi energy of the probe with respect to states near the dielectric surface, individual electrons are repeatably manipulated in and out of the sample. The single-electron charging and discharging is detected by frequency detection electrostatic force microscopy.
Type Text
Publisher American Institute of Physics (AIP)
Journal Title Applied Physics Letters
Volume 86
Issue 16
First Page 163109
Last Page 163101
DOI 10.1063/1.1897429
citatation_issn 36951
Language eng
Bibliographic Citation Bussmann, E., Zheng, N., & Williams, C. C. (2005). Single-electron manipulation to and from a SiO2 surface by electrostatic force microscopy. Applied Physics Letters, 86(16), Apr., 163109-1-3.
Rights Management (c)American Institute of Physics. The following article by Bussmann, E., Zheng, N., & Williams, C. C. appeared in Journal of Applied Physics Letters, 86(16), 2005 and may be found at htt://www.DOI: 10.1063/1.1897429.
Format Medium application/pdf
Format Extent 230,741 bytes
Identifier ir-main,5146
ARK ark:/87278/s6zc8mdv
Setname ir_uspace
ID 706021
Reference URL https://collections.lib.utah.edu/ark:/87278/s6zc8mdv
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