Growth and characterization of TaN/TiN superlattice structures

Epitaxial B1 NaCl-structured TaN(3 nm)/TiN(2 nm) superlattice structures were grown on Si(100) substrates with a TiN buffer layer, using pulsed-laser deposition. A special target assembly was used to manipulate the thickness of each layer. X-ray diffraction, transmission electron microscopy, and scanning transmission electron microscopy (Z contrast! studies confirmed the single-crystalline nature of the superlattice with a uniform layer structure. Nanoindentation results suggest the high hardness of these superlattice structures. Four-point-probe resistivity measurements show low resistivity of the heterostructures and a Cu diffusion characteristic study proved this superlattice system can be a promising diffusion barrier and can withstand 700 °C annealing for 30 min.