| Publication Type | journal article |
| School or College | College of Engineering |
| Department | Electrical & Computer Engineering; Materials Science & Engineering |
| Creator | Stringfellow, Gerald B. |
| Other Author | Seong, Tae-Yeon; Kim, Joon Hyung; Chun, Y. S. |
| Title | Effects of V/III ratio on ordering and antiphase boundaries in GaInP layers |
| Date | 1997 |
| Description | Transmission electron microscope (TEM) and transmission electron diffraction (TED) studies have been performed to investigate the effects of V/III ratio on ordering and antiphase boundaries (APBs) in organometallic vapor phase epitaxial Ga0.5In0.5P layers grown onto (001) GaAs vicinal substrates at 670 °C. TED and TEM examination showed that the degree of order is higher in the layer grown using a V/III ratio of 160 than in the layer grown using a V/III ratio of 40. TEM results showed that the higher V/III ratio could be used to suppress APBs. In addition, the growth of order-induced heterostructures, where the V/III ratio is increased abruptly during growth, could be used to block the propagation of APBs. Mechanisms are proposed to explain these phenomena. |
| Type | Text |
| Publisher | American Institute of Physics (AIP) |
| Volume | 70 |
| Issue | 23 |
| Subject | Antiphase boundaries; APB; Heterostructures; Organometallics |
| Subject LCSH | Epitaxy; Metal organic chemical vapor deposition |
| Language | eng |
| Bibliographic Citation | Seong, T.Y., Kim, J.H., Chun, Y.S., & Stringfellow, G.B. (1997). "Effects of V/III ratio on ordering and antiphase boundaries in GaInP layers." Applied Physics Letters, 70(23), 3137. |
| Rights Management | ©American Institute of Physics. The following article appeared in Seong, T.Y., Kim, J.H., Chun, Y.S., & Stringfellow, G.B. Applied Physics Letters, 70 |
| Format Medium | application/pdf |
| Format Extent | 74,752 Bytes |
| Identifier | ir-main,632 |
| ARK | ark:/87278/s6hq4h1k |
| Setname | ir_uspace |
| ID | 702660 |
| Reference URL | https://collections.lib.utah.edu/ark:/87278/s6hq4h1k |