Micromachined submicrometer photodiode for scanning probe microscopy

Update Item Information
Publication Type Journal Article
School or College College of Science
Department Physics
Creator Williams, Clayton C.
Other Author Davis, R. C.; Neuzil, P.
Title Micromachined submicrometer photodiode for scanning probe microscopy
Date 1995
Description A submicrometer photodiode probe with a sub-50 nanometer tip radius has been developed for optical surface characterization on a nanometer scale. The nanoprobe is built to detect subwavelength optical intensity variations in the near field of an illuminated surface. The probe consists of an Al-Si Schottky diode constructed near the end of a micromachined pyramidal silicon tip. The process for batch fabrication of the nanoprobes is described. Electrical and optical characterization measurements of the nanoprobe are presented. The diode has a submicrometer optically sensitive area with a 150 fW sensitivity.
Type Text
Publisher American Physical Society
Volume 66
Issue 18
First Page 2309
Last Page 2311
Subject Submicrometer; Photodiode; Scanning probe microscopy; Nanoprobe
Subject LCSH Near-field microscopy; Nanotechnology; Microscopy
Dissertation Institution University of Utah
Language eng
Bibliographic Citation Davis, R. C., Williams, C. C., & Neuzil, P. (1995). Micromachined submicrometer photodiode for scanning probe microscopy. Applied Physics Letters, 66(18), 2309-11.
Rights Management (c) American Physical Society
Format Medium application/pdf
Format Extent 137,960 Bytes
Identifier ir-main,5176
ARK ark:/87278/s6fx7tr9
Setname ir_uspace
ID 703994
Reference URL https://collections.lib.utah.edu/ark:/87278/s6fx7tr9
Back to Search Results