Publication Type |
Journal Article |
School or College |
College of Engineering |
Department |
Electrical & Computer Engineering; Materials Science & Engineering |
Creator |
Stringfellow, Gerald B. |
Title |
Electron mobility in AlxGa1-xAs |
Date |
1979-06 |
Description |
he electron mobility in AlxGa1-xAs grown by several techniques has been studied to determine whether VPE layers are more highly compensated than comparable LPE layers. The techniques used to grow layers included (1) organometallic VPE using Al(CH3)3, AsH3, and Ga(C2H5)3 or Ga(CH3)3, (2) ''hybrid'' organometallic technique using HCl to reduce C and O contamination, (3) standard AsH3+HCl VPE (GaAs only), and (4) LPE. The mobilities in VPE and LPE AlxGa1-xAs are found to be similar, and to depend strongly on solid composition, x. The temperature dependence of the electron mobility indicates that both compensation and space-charge scattering increase with x and contribute to the reduction of electron mobility. |
Type |
Text |
Publisher |
American Institute of Physics (AIP) |
Volume |
50 |
Issue |
6 |
First Page |
4178 |
Last Page |
4183 |
Subject |
Alloys; Organometallics |
Subject LCSH |
Electron mobility; Organometallic compounds; Epitaxy |
Language |
eng |
Bibliographic Citation |
Stringfellow, G. B. (1979). Electron mobility in AlxGa1-xAs. Journal of Applied Physics, 50(6), 4178-83. |
Rights Management |
(c)American Institute of Physics. The following article appeared in Stringfellow, G. B., Journal of Applied Physics, 50(6) 1979 |
Format Medium |
application/pdf |
Format Extent |
384,577 bytes |
Identifier |
ir-main,1894 |
ARK |
ark:/87278/s6qc0n4g |
Setname |
ir_uspace |
ID |
707079 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6qc0n4g |