Publication Type |
Journal Article |
School or College |
College of Engineering |
Department |
Electrical & Computer Engineering; Materials Science & Engineering |
Creator |
Stringfellow, Gerald B.; Shurtleff, James Kevin |
Other Author |
Jun, S.W. |
Title |
Surfactant effects on doping of GaAs grown by organometallic vapor phase epitaxy |
Date |
2001 |
Description |
Recently, the addition of the isoelectronic surfactant Sb during organometallic vapor phase epitaxy (OMVPE) of GaInP was shown to eliminate ordering, resulting in a significant change in the band gap energy. These results suggest that surfactants added during growth could have profound affects on other important properties of semiconductors, such as doping. This letter presents the results of a recent study on the effects of the isoelectronic surfactant Sb on doping in GaAs. The addition of a small amount of triethylantimony during OMVPE of GaAs is found, using secondary ion mass spectroscopy analysis, to increase the Zn doping concentration from <6x10[sup 18] atoms/cm[sup 3] to 9x10[sup 18] atoms/cm[sup 3], a factor of 1.6. The amount of antimony introduced into the solid is only 2-3x10[sup 17] atoms/cm[sup 3]. The addition of Sb also increases the impurity concentration of In in GaAs, but does not affect the concentration of Te or P. © 2001 American Institute of Physics. |
Type |
Text |
Publisher |
American Institute of Physics (AIP) |
Journal Title |
Applied Physics Letters |
Volume |
78 |
Issue |
20 |
First Page |
3038 |
DOI |
10.1063/1.1371790 |
citatation_issn |
36951 |
Subject |
Gallium arsenide; Surfactants; Semiconductors |
Subject LCSH |
Surface active agents; Order-disorder in alloys |
Language |
eng |
Bibliographic Citation |
Shurtleff, J.K., Jun, S.W., & Stringfellow, G.B. (2001). "Surfactant Effects on Doping of GaAs Grown by Organometallic Vapor Phase Epitaxy." Applied Physics Letters 78(20), 3038. |
Rights Management |
(c)American Institute of Physics. The following article appeared in Shurtleff, J.K., Jun, S.W., & Stringfellow, G.B., Applied Physics Letters, 78(20), 2001 and may be found at http://dx.doi.org DOI: 10.1063/1.1371790 |
Format Medium |
application/pdf |
Format Extent |
50,518 bytes |
Identifier |
ir-main,1909 |
ARK |
ark:/87278/s6891pz9 |
Setname |
ir_uspace |
ID |
702456 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6891pz9 |