Publication Type |
Journal Article |
School or College |
College of Engineering |
Department |
Electrical & Computer Engineering; Materials Science & Engineering |
Creator |
Stringfellow, Gerald B. |
Other Author |
McCalmont, J. S.; Casey, H. C. Jr.; Wang, T. Y. |
Title |
Effect of oxygen incorporation in semi-insulating (AlxGa1-x)yIn1-yP |
Date |
1992 |
Description |
Discusses a study conducted on oxygen-doped, semi-insulating layers of (aluminum-gallium) indium phosphide grown on gallium arsenide using organometallic vapor phase epitaxy. Effect of oxygen doping on semi-insulating layers of the substance; Secondary-ion mass spectrometry measurements; Measured concentration of oxygen in the layers of the substance in samples used in the study. |
Type |
Text |
Publisher |
American Institute of Physics (AIP) |
Volume |
71 |
Issue |
2 |
First Page |
1046 |
Last Page |
1048 |
Subject |
Inactive interstitial atoms; Energy-dispersive spectoscopy; intentional oxygen |
Subject LCSH |
Epitaxy; Metal organic chemical vapor deposition; Semiconductor doping |
Language |
eng |
Bibliographic Citation |
Stringfellow, G. B., McCalmont, J. S., Casey, H. C. Jr., & Wang, T. Y. (1992) Effect of oxygen incorporation in semi-insulating (AlxGa1-x)yIn1-yP. Journal of Applied Physics, 71(2), 1046-8. |
Rights Management |
(c)American Institute of Physics. The following article appeared in Stringfellow, G. B., McCalmont, J. S., Casey, H. C. Jr., & Wang, T. Y., Journal of Applied Physics. 71(2), 1992 |
Format Medium |
application/pdf |
Format Extent |
226,636 bytes |
Identifier |
ir-main,1886 |
ARK |
ark:/87278/s65q5dr1 |
Setname |
ir_uspace |
ID |
707415 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s65q5dr1 |