Publication Type |
Journal Article |
School or College |
College of Science |
Department |
Physics |
Creator |
Williams, Clayton C. |
Other Author |
Davis, R. C.; Neuzil, P. |
Title |
Micromachined submicrometer photodiode for scanning probe microscopy |
Date |
1995 |
Description |
A submicrometer photodiode probe with a sub-50 nanometer tip radius has been developed for optical surface characterization on a nanometer scale. The nanoprobe is built to detect subwavelength optical intensity variations in the near field of an illuminated surface. The probe consists of an Al-Si Schottky diode constructed near the end of a micromachined pyramidal silicon tip. The process for batch fabrication of the nanoprobes is described. Electrical and optical characterization measurements of the nanoprobe are presented. The diode has a submicrometer optically sensitive area with a 150 fW sensitivity. |
Type |
Text |
Publisher |
American Physical Society |
Volume |
66 |
Issue |
18 |
First Page |
2309 |
Last Page |
2311 |
Subject |
Submicrometer; Photodiode; Scanning probe microscopy; Nanoprobe |
Subject LCSH |
Near-field microscopy; Nanotechnology; Microscopy |
Dissertation Institution |
University of Utah |
Language |
eng |
Bibliographic Citation |
Davis, R. C., Williams, C. C., & Neuzil, P. (1995). Micromachined submicrometer photodiode for scanning probe microscopy. Applied Physics Letters, 66(18), 2309-11. |
Rights Management |
(c) American Physical Society |
Format Medium |
application/pdf |
Format Extent |
137,960 Bytes |
Identifier |
ir-main,5176 |
ARK |
ark:/87278/s6fx7tr9 |
Setname |
ir_uspace |
ID |
703994 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6fx7tr9 |