Publication Type |
Journal Article |
School or College |
College of Engineering |
Department |
Materials Science & Engineering |
Creator |
Scarpulla, Michael |
Other Author |
Mate, C. Mathew; Yen, Bing K.; Miller, Dolores C.; Toney, Mike F.; Frommer, Jane E. |
Title |
New methodologies for measuring film thickness, coverage, and topography |
Date |
2000-01 |
Description |
We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thin amorphous nitrogenated carbon (CNx) overcoats on disks. Each technique has its own strengths: XRR measures film thickness absolutely, ESCA determines the chemical composition of the films, and AFM maps topography accurately. For the CNx overcoats investigated, we find incomplete coverage for thicknesses less than 20 Å, and we find a small surface roughness with rms roughness ≤ 11 Å. |
Type |
Text |
Publisher |
Institute of Electrical and Electronics Engineers (IEEE) |
Journal Title |
IEEE Transactions on Magnetics |
Volume |
36 |
Issue |
1 |
First Page |
110 |
Last Page |
114 |
DOI |
10.1109/20.824434 |
citatation_issn |
189464 |
Subject |
Atomic force microscopy; Electron spectroscopy for chemical analysis; X-ray reflectivity |
Subject LCSH |
Thin films; Spectrum analysis; X-rays -- Scattering |
Language |
eng |
Bibliographic Citation |
Mate, C. M., Yen, B. K., Miller, D. C., Toney, M. F., Scarpulla, M., & Frommer, J. E. (2000). New methodologies for measuring film thickness, coverage, and topography, IEEE Transactions on Magnetics, 36(1), 110-4. |
Rights Management |
(c) 2000 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. http://dx.doi.org/10.1109/20.824434 |
Format Medium |
application/pdf |
Format Extent |
88,161 bytes |
Identifier |
ir-main,12289 |
ARK |
ark:/87278/s6dz0sds |
Setname |
ir_uspace |
ID |
702478 |
Reference URL |
https://collections.lib.utah.edu/ark:/87278/s6dz0sds |