Deep subwavelength patterning via absorbance modulation

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Title Deep subwavelength patterning via absorbance modulation
Publication Type thesis
School or College College of Engineering
Department Electrical & Computer Engineering
Author Manthena, Rajakumar Varma
Date 2010-08
Description Creating very small structures in the resist exceeding di raction limit is becoming a bottle-neck in lithography especially for nanoscale features. A novel optical lithography technique that has the ability to overcome the di raction barrier is Absorbance Modulation Interferometric-Lithography (AMIL). Feasibility of this technique is experimentally veri ed. In this approach of absorbance modulation, a standing wave at wavelength ?2 (633nm) is overlaid with a uniform beam from a light-emitting diode with a center wavelength at ?1 (310nm). Both beams illuminate a photoresist lm overcoated with a photochromic layer. This photochromic layer localizes the transmitted light at ?1 to subwavelength spatial dimensions. The subwavelength lines are spaced by a di raction-limited grating period. In order to generate dense lines, the sample is mounted on a single-axis high precision scanning stage that will enable multiple exposures.
Type Text
Publisher University of Utah
Subject Absorbance; AMIL; BTE; Diarylethene; Photochromic; Subwavelength
Dissertation Institution University of Utah
Dissertation Name Master of Science
Language eng
Rights Management Copyright © Rajakumar Varma Manthena 2010
Format application/pdf
Format Medium application/pdf
Format Extent 14,732,720 bytes
Identifier us-etd3,41279
Source Original housed in Marriott Library Special Collections, TK7.5 2011 .M36
ARK ark:/87278/s62238h0
Setname ir_etd
ID 194788
Reference URL https://collections.lib.utah.edu/ark:/87278/s62238h0
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