Electron mobility in AlxGa1-xAs

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Publication Type Journal Article
School or College College of Engineering
Department Electrical & Computer Engineering; Materials Science & Engineering
Creator Stringfellow, Gerald B.
Title Electron mobility in AlxGa1-xAs
Date 1979-06
Description he electron mobility in AlxGa1-xAs grown by several techniques has been studied to determine whether VPE layers are more highly compensated than comparable LPE layers. The techniques used to grow layers included (1) organometallic VPE using Al(CH3)3, AsH3, and Ga(C2H5)3 or Ga(CH3)3, (2) ''hybrid'' organometallic technique using HCl to reduce C and O contamination, (3) standard AsH3+HCl VPE (GaAs only), and (4) LPE. The mobilities in VPE and LPE AlxGa1-xAs are found to be similar, and to depend strongly on solid composition, x. The temperature dependence of the electron mobility indicates that both compensation and space-charge scattering increase with x and contribute to the reduction of electron mobility.
Type Text
Publisher American Institute of Physics (AIP)
Volume 50
Issue 6
First Page 4178
Last Page 4183
Subject Alloys; Organometallics
Subject LCSH Electron mobility; Organometallic compounds; Epitaxy
Language eng
Bibliographic Citation Stringfellow, G. B. (1979). Electron mobility in AlxGa1-xAs. Journal of Applied Physics, 50(6), 4178-83.
Rights Management (c)American Institute of Physics. The following article appeared in Stringfellow, G. B., Journal of Applied Physics, 50(6) 1979
Format Medium application/pdf
Format Extent 384,577 bytes
Identifier ir-main,1894
ARK ark:/87278/s6qc0n4g
Setname ir_uspace
ID 707079
Reference URL https://collections.lib.utah.edu/ark:/87278/s6qc0n4g
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