Depth dependent carrier density profile by scanning capacitance microscopy

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Publication Type Journal Article
School or College College of Science
Department Physics
Creator Williams, Clayton C.
Other Author Kang, C. J.; Kim, C. K.; Kuk, Y.; Mang, K. M.; Lee, J. K.; Suh, K. S.
Title Depth dependent carrier density profile by scanning capacitance microscopy
Date 1997
Description The depth dependent carrier density was measured on an arsenic implanted silicon sample using scanning capacitance microscopy (SCM). The capacitance versus voltage scan was performed by applying dc biases with a dither ac signal. A strong dc bias dependence was observed at the interface of an abrupt junction between n1 and p. The bias dependent SCM images show good agreement with quasi-three dimensional simulations, suggesting that they can be used to map a device structure.
Type Text
Publisher American Institute of Physics (AIP)
Volume 71
Issue 11
Subject Carrier density; Silicon submicrometer technology; Scanning capacitance microscopy
Subject LCSH Microscopy; Catalyst supports
Language eng
Bibliographic Citation Kang, C. J., Kim, C. K., Kuk, Y., Mang, K. M., Lee, J. K., Suh, K. S., & Williams, C. C. (1997). Depth dependent carrier density profile by scanning capacitance microscopy. Applied Physics Letters, 71(11), 1546.
Rights Management (c)American Institute of Physics. The following article appeared in Kang, C. J., Kim, C. K., Kuk, Y., Mang, K. M., Lee, J. K., Suh, K. S., & Williams, C. C. Applied Physics Letters, 71(11), 1997, and may be found at http://link.aip.org./?APPLAB/71/1/1546/1
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Identifier ir-main,5167
ARK ark:/87278/s62r490z
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ID 704553
Reference URL https://collections.lib.utah.edu/ark:/87278/s62r490z
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