Effects of low surfactant Sb coverage on Zn and C incorporation in GaP

Update Item Information
Publication Type Journal Article
School or College College of Engineering
Department Electrical & Computer Engineering
Creator Stringfellow, Gerald B.
Other Author Howard, A. D.
Title Effects of low surfactant Sb coverage on Zn and C incorporation in GaP
Date 2007
Description The use of surfactants during the vapor phase growth of III-V materials to control fundamental characteristics of epitaxial layers is becoming increasingly important. We have investigated the remarkable effects of Sb, from triethylantimony (TESb) Pyrolysis, on the Zn doping during the organometallic vapor phase epitaxial growth (OMVPE) of GaP. Antimony is isoelectric with the P host; therefore it is not a dopant in this material. It is also much larger than P so little incorporation occurs.
Type Text
Publisher American Institute of Physics (AIP)
Journal Title Journal of Applied Physics
Volume 102
Issue 7
First Page 74920
DOI 10.1063/1.2778635
citatation_issn 218979
Subject Surfactants; Organometallic vapor phase epitaxy; Gallium phosphide
Subject LCSH Epitaxy; Antimony; Doped semiconductors; Semiconductor doping
Language eng
Bibliographic Citation Howard, A. D., & Stringfellow, G. B. (2007). Effects of low surfactant Sb coverage on Zn and C incorporation in GaP. Journal of Applied Physics, 102(7), no.074920.
Rights Management (c)American Institute of Physics. The following article appeared in Howard, A. D., & Stringfellow, G. B., Journal of Applied Physics, 102(7), 2007 and may be found at http://dx.doi.org/10.1063/1.2778635.
Format Medium application/pdf
Format Extent 485,200 bytes
Identifier ir-main,7822
ARK ark:/87278/s6ng57rw
Setname ir_uspace
ID 702659
Reference URL https://collections.lib.utah.edu/ark:/87278/s6ng57rw
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