Surfactant effects on doping of GaAs grown by organometallic vapor phase epitaxy

Update Item Information
Publication Type Journal Article
School or College College of Engineering
Department Electrical & Computer Engineering; Materials Science & Engineering
Creator Stringfellow, Gerald B.; Shurtleff, James Kevin
Other Author Jun, S.W.
Title Surfactant effects on doping of GaAs grown by organometallic vapor phase epitaxy
Date 2001
Description Recently, the addition of the isoelectronic surfactant Sb during organometallic vapor phase epitaxy (OMVPE) of GaInP was shown to eliminate ordering, resulting in a significant change in the band gap energy. These results suggest that surfactants added during growth could have profound affects on other important properties of semiconductors, such as doping. This letter presents the results of a recent study on the effects of the isoelectronic surfactant Sb on doping in GaAs. The addition of a small amount of triethylantimony during OMVPE of GaAs is found, using secondary ion mass spectroscopy analysis, to increase the Zn doping concentration from <6x10[sup 18] atoms/cm[sup 3] to 9x10[sup 18] atoms/cm[sup 3], a factor of 1.6. The amount of antimony introduced into the solid is only 2-3x10[sup 17] atoms/cm[sup 3]. The addition of Sb also increases the impurity concentration of In in GaAs, but does not affect the concentration of Te or P. © 2001 American Institute of Physics.
Type Text
Publisher American Institute of Physics (AIP)
Journal Title Applied Physics Letters
Volume 78
Issue 20
First Page 3038
DOI 10.1063/1.1371790
citatation_issn 36951
Subject Gallium arsenide; Surfactants; Semiconductors
Subject LCSH Surface active agents; Order-disorder in alloys
Language eng
Bibliographic Citation Shurtleff, J.K., Jun, S.W., & Stringfellow, G.B. (2001). "Surfactant Effects on Doping of GaAs Grown by Organometallic Vapor Phase Epitaxy." Applied Physics Letters 78(20), 3038.
Rights Management (c)American Institute of Physics. The following article appeared in Shurtleff, J.K., Jun, S.W., & Stringfellow, G.B., Applied Physics Letters, 78(20), 2001 and may be found at http://dx.doi.org DOI: 10.1063/1.1371790
Format Medium application/pdf
Format Extent 50,518 bytes
Identifier ir-main,1909
ARK ark:/87278/s6891pz9
Setname ir_uspace
ID 702456
Reference URL https://collections.lib.utah.edu/ark:/87278/s6891pz9
Back to Search Results